Optical properties of surface micromachined mirrors with etch holes

Journal of Microelectromechanical Systems

Volumn 8, Issue 4, 1999, Pages 506-513

  Zou, Jun ^a   Balberg, Michal ^b   Byrne, Colin ^b   Liu, Chang ^a,b   Brady, David J ^b  

^a Microelectronics Laboratory   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; ETCHING; LIGHT REFLECTION; MICROMACHINING; POLYCRYSTALLINE MATERIALS; SILICON;

ETCH HOLES; SURFACE MICROMACHINED POLYCRYSTALLINE SILICON REFLECTORS;

MIRRORS;

EID: 0033334457     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.809066     Document Type: Article

References (17)

1. M. C. Wu, "Micromachining for optical and optoelectronics systems," Proc. IEEE, vol. 85, pp. 1833-1856, Nov. 1997.
2. M. H. Kiang, O. Solgaard, K. Y. Lau, and R. S. Muller, "Electrostatic combdrive-actuated micromirrors for laser beam scanning and positioning," IEEE J. Micmelectromech. Syst., vol. 7, pp. 27-37, Mar. 1998.
3. L. Hombeck, "Digital light processing and MEMS: Timely convergence for a bright future," in SPIE Thermatic Applied Science and Engineering Series, Micromachining and Microfabrication'95, pp. 3-21, 1995.
4. MUMPS process, offered by the Microelectronics Center of South Carolina, SC. (1996, Mar.). MUMPS process [Online]. Available HTTP: http://www.mcnc.org
5. M. Marazzi, M. E. Giardini, A. Borghesi, A. Sassela, M. Alessandri, and G. Ferroni, "Optical properties of polycrystalline silicon thin films deposited by single wafer chemical vapor deposition," Thin Solid Films, vol. 296, no. 1/2, pp. 91-93, 1997.
6. G. Harbeke, "Optical properties of polycrystalline silicon films, polycrystalline semiconductors: Physical properties and applications," in Proc. Int. School Mat. Sci. and Tech., 1985, pp. 156-169.
7. V. P. Jaecklin, C. Linder, J. Brugger, N. F. de Rooij, J. M. Moret, and R. Vuilleumier, "Mechanical and optical properties of surface micromachined torsional mirrors in silicon, polysilicon, and aluminum," Sens. Actuators A. Phys., vol. A43, nos. 1-3, pp. 269-275, 1994.
8. Y. Laghla and E. Scheid, "Optical study of undoped, B or P-doped polysilicon," Thin Solid Films, vol. 306, no. 1, pp. 67-73, 1997.
9. C. A. Dimitriadis, S. Logothetidis, N. A. Economou, and P. A. Coxon, "Effects of surface roughness and grain size on the optical properties of LPCVD polysilicon films and the electrical properties of MOSFET's," in Proc. 20th Int. Conf. Physics of Semiconductors, 1990, pp. 395-398.
10. S. Chandrasekhar, A. S. Vengurlekar, S. K. Roy, and V. T. Karulkar, "Nonlinear temperature dependence of the refractive index of polycrystalline silicon films and the influence of microstructural disorder," J. Appl. Phys., vol. 63, no. 6, pp. 2072-2076, 1988.
11. J. P. Ferraton, C. Ance, and F. de Chelle, "Static refractive index of hydrogenated amorphous and polycrystalline silicon between 293 K and 973 K," Thin Solid Films, vol. 173, no. 2, pp. 155-161, 1989.
12. J. H. Ho, C. L. Lee, T. F. Lei, and T. S. Chao, "Ellipsometry measurement of the complex refractive index and thickness of polysilicon thin films," J. Opt. Soc. Amer. A. Opt. Image Sci., vol. 7, no. 2, pp. 196-205, 1990.
13. Y. Yi and C. Liu, "Parallel assembly of hinged microstructures using magnetic actuator," in Proc. IEEE Solid-State Sensor and Actuator Workshop, Hilton Head Island, SC, June 8-11, 1998, pp. 269-272.
14. C. A. Balanis, Advanced Engineering Electromagnetics. New York: Wiley, 1989.
15. S. A. Akhmanov and S. Yu Nikitin, Physical Optics. Oxford, UK: Clarendon, 1997.
16. J. M. Bennett and L. Mattsson, Introduction to Surface Roughness and Scattering. Washington, DC: Opt. Soc. of Amer., 1989.
17. E. D. Palik, Handbook of Optical Constants, vol. 1. New York: Academic, 1985.