The oxidation kinetics of Mg-, Si- and Fe-implanted aluminum by using X-ray photoelectron spectroscopy

Surface Science

Volumn 433-435, Issue , 1999, Pages 765-769

  Do, T ^a   McIntyre, N S ^a   Van Der Heide, P A W ^b  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b University of Houston   (United States)

Author keywords

Aluminum oxide; Ion implantation; Oxidation; Surface chemical reaction; XPS

Indexed keywords

ALUMINA; DIFFUSION; ION IMPLANTATION; IRON; MAGNESIUM; OXIDATION; REACTION KINETICS; SECONDARY ION MASS SPECTROMETRY; SILICON; SURFACES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPTH PROFILES; MAXIMUM CONCENTRATION; METAL VACANCIES; NEAR SURFACE REGION;

ALUMINUM;

EID: 0033330415     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00488-4     Document Type: Article

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