Oxidation kinetics of Mg-, Si-, and Fe-implanted aluminum by using X-ray photoelectron spectroscopy

Journal of Physical Chemistry B

Volumn 103, Issue 13, 1999, Pages 2402-2407

  Do, T ^a   McIntyre, N S ^a   Van Der Heide, P A W ^b   Akano, U G ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION; IRON; MAGNESIUM; OXIDATION; REACTION KINETICS; SECONDARY ION MASS SPECTROMETRY; SILICON; VAPOR PRESSURE; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM THIN OXIDE FILMS;

ALUMINUM;

EID: 0345072509     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp983221o     Document Type: Article

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