Large second-order susceptibility generated in the cathodic face of silica by doping F- anions

Optics Communications

Volumn 172, Issue 1, 1999, Pages 97-101

  Qiu, Mingxin ^a   Takagaki, Yoshifumi ^a   Egawa, Shinji ^a   Mizunami, Toru ^a   Vilaseca, R ^b  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITAT POLITÈCNICA DE CATALUNYA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); SECOND HARMONIC GENERATION; SILICA;

ARRHENIUS PLOTS;

OPTICAL GLASS;

EID: 0033328812     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(99)00578-7     Document Type: Article

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