Coulomb interaction effect correction in electron-beam block exposure lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 12 B, 1999, Pages 7217-7221

  Takahashi, Kimitoshi ^a   Manabe, Yasuo ^a   Hoshino, Hiromi ^a   Nara, Yasuo ^a   Machida, Yasuhide ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Block exposure; Coulomb interaction; Electron beam lithography; Proximity effect correction

Indexed keywords

ELECTRIC CURRENTS;

BLOCK EXPOSURE LITHOGRAPHY; COULOMB INTERACTION; PROXIMITY EFFECT CORRECTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033326759     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.7217     Document Type: Article

References (14)

1. A. N. Broers: IEEE Trans. Electon Devices 28 (1981) 1268.
2. H. C. Pfeiffcr: IEEE Trans. Electron Devices 26 (1979) 663.
3. Y. Sohda, Y. Someda and N. Saitou: J. Vac. Sci. Technol. B13 (1995) 2419.
4. G. H. Jansen: Coulomb Interactions in particle Beams (Academic Press, Boston, 1990).
5. S. D. Berger, J. M. Gibson, R. M. Camarda, R. C. Farrow, H. A. Huggins, J. S. Kraus, and J. A. Liddle: J. Vac. Sci. Technol. B9 (1995) 2996.
6. L. R. Harriott: J. Vac. Sci. Technol. B15 (1997) 2130.
7. H. C. Pfeiffer and W. Stickel: Microelectron. Eng. 27 (1995) 143.
8. H. Yamashita, K. Tokunaga, Y. Kojima and H. Nozue: J. Vac. Sci. Technol. B13 (1995) 2473.
9. K. Takahashi, S. Yamazaki, M. Ohno, H. Watanabe, T. Sakakibara, M. Satoh, T. Nagata, A. Yamada, H. Yasuda, Y. Kara and N. Sasaki: Proc. SPIE 3048 (1997) 44.
10. K. Takahashi, H. Kanata and Y. Kara: J. Vac. Sci. Technol. B16 (1998) 3279.
11. H. Yasuda, K. Sakamoto, A. Yamada and K. Kawashima: Jpn. J. Appl. Phys. 30 (1991) 3098.
12. T. Nagata, Y. Manabe, Y. Nara, N. Sasaki and Y. Machida: Proc. SPIE 3331 (1997) 334.
13. H. Yamashita, T. Tamura, E. Nomura and H. Nozue: Jpn. J. Appl. Phys. 34 (1995) 6684.
14. Y. Takahashi, A. Yamada, Y. Oae, H. Yasuda and K. Kawashima: J. Vac. Sci. Technol. B10 (1992) 2794.