Multi step process yield control with large system models

Proceedings of the American Control Conference

Volumn 3, Issue , 1997, Pages 1573-1574

  Rietman, Edward A ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; FEEDBACK CONTROL; NEURAL NETWORKS; PLASMA ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

MULTISTEP PROCESS YIELD CONTROL;

PROCESS CONTROL;

EID: 0030707281     PISSN: 07431619     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)