|
Volumn 357, Issue 1, 1999, Pages 26-30
|
Multispecies step-flow model of growth of compound thin films by MOCVD
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CRYSTAL GROWTH;
FILM GROWTH;
MATHEMATICAL MODELS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
OXIDE SUPERCONDUCTORS;
PHASE COMPOSITION;
REACTION KINETICS;
STOICHIOMETRY;
STEP FLOW;
SUPERCONDUCTING FILMS;
|
EID: 0033323443
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(99)00469-1 Document Type: Article |
Times cited : (3)
|
References (10)
|