Formation process of CuCl nano-particles in silica glass by ion implantation

Journal of Non-Crystalline Solids

Volumn 259, Issue 1-3, 1999, Pages 93-99

  Fukumi, K ^a   Chayahara, A ^a   Kageyama, H ^a   Kadono, K ^a   Akai, T ^a   Kitamura, N ^a   Mizoguchi, H ^a   Horino, Y ^a   Makihara, M ^a   Fujii, K ^a   Hayakawa, J ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL BONDS; COPPER COMPOUNDS; CRYSTAL ATOMIC STRUCTURE; CRYSTAL GROWTH; FUSED SILICA; HIGH TEMPERATURE APPLICATIONS; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; PARTICLES (PARTICULATE MATTER); SECONDARY ION MASS SPECTROMETRY; X RAY SPECTROSCOPY;

COPPER CHLORIDE; NANOPARTICLES;

OPTICAL GLASS;

EID: 0033323217     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(99)00526-8     Document Type: Article

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