NGas absorption in cathodic arc apparatus with an al cathode under medium vacuum

IEEE Transactions on Plasma Science

Volumn 27, Issue 4, 1999, Pages 1034-1038

  Takikawa, Hirofumi ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

A1n film; Al evaporation rate; N2 gas absorption rate; Pressure dependence; Reactive cathodic vacuum arc

Indexed keywords

CATHODES; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; GAS ABSORPTION; NITROGEN; PLASMA DENSITY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; THIN FILMS; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

ALUMINUM NITRIDE FILM; REACTIVE CATHODIC VACUUM ARC;

ELECTRIC ARCS;

EID: 0033321399     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.782277     Document Type: Article

References (12)

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