Electron injection into an ECR ion source magnetic field configuration

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 155, Issue 4, 1999, Pages 498-505

  Ovsyannikov, V P ^a   Ullmann, F ^a   Zschornack, G ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; CARRIER CONCENTRATION; ELECTRON BEAMS; ELECTRON ENERGY LEVELS; ELECTRON GUNS; ION SOURCES; MAGNETIC FIELDS; PLASMA CONFINEMENT;

ELECTRON INJECTION; REFLECTING MODE ELECTRON;

SEMICONDUCTOR PLASMAS;

EID: 0033319065     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00466-8     Document Type: Article

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