High secondary electron emission for an enhanced electron density in election cyclotron resonance plasma

Review of Scientific Instruments

Volumn 69, Issue 2 pt 2, 1998, Pages 706-708

  Schachter, L ^a   Dobrescu, S ^a   Badescu Singureanu, Al I ^a   Baltateanu, N ^a  

^a HORIA HULUBEI NATIONAL INSTITUTE OF PHYSICS AND NUCLEAR ENGINEERING   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CARRIER CONCENTRATION; DIFFUSION; ELECTRIC VARIABLES MEASUREMENT; ELECTRON BEAMS; ELECTRON CYCLOTRON RESONANCE; ELECTRON EMISSION; ELECTRONS; STRUCTURE (COMPOSITION); THERMAL EFFECTS;

AMBIPOLAR DIFFUSION EFFECT; BIAS; EFFECTIVE SECONDARY ELECTRON EMISSION COEFFICIENT; ELECTRON IMPACT; METAL DIELECTRIC STRUCTURE; PLASMA CHAMBER; PLASMA ELECTRIC POTENTIAL EFFECT; SECONDARY ELECTRON EMISSION;

PLASMAS;

EID: 0032003590     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148557     Document Type: Article

References (6)