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Optik (Jena)
Volumn 110, Issue 12, 1999, Pages 563-568
General condition for moving objective lens (MOL) with combined electrostatic and magnetic fields
Author keywords

[No Author keywords available]
Indexed keywords

ABERRATIONS; ELECTROSTATICS; FOCUSING; MAGNETIC FIELD EFFECTS;
EID: 0033319006     PISSN: 00304026     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)
References (11)
  • 1
    • 0015197736 scopus 로고
    • Elimination of third order aberrations in electron beam scanning systems
    • Ohiwa H, Goto E, Ono A: Elimination of third order aberrations in electron beam scanning systems. Electr. Commun. Japan 54B (1971) 44-51
    • (1971) Electr. Commun. Japan , vol.54 B , pp. 44-51
    • Ohiwa, H.1    Goto, E.2    Ono, A.3
  • 2
    • 0019634572 scopus 로고
    • Advanced deflection concept for large area, high resolution e-beam lithography
    • Pfeiffer HC, Langner GO: Advanced deflection concept for large area, high resolution e-beam lithography. J. Vac. Sci. Technol. 19 (1981) 1059-1063
    • (1981) J. Vac. Sci. Technol. , vol.19 , pp. 1059-1063
    • Pfeiffer, H.C.1    Langner, G.O.2
  • 3
    • 0026839405 scopus 로고
    • Telecentric beam positioning for advanced e-beam lithography
    • Stickel W, Langner GO, Petric PF: Telecentric beam positioning for advanced e-beam lithography. Microcircuit Eng. 17 (1992) 25-28
    • (1992) Microcircuit Eng. , vol.17 , pp. 25-28
    • Stickel, W.1    Langner, G.O.2    Petric, P.F.3
  • 4
    • 0020793603 scopus 로고
    • The optical properties of "Swing Objective lens" in a combined magnetic lens and deflection systems with superimposed fields
    • Chen ZW, Qui PY, Wang JK: The optical properties of "Swing Objective lens" in a combined magnetic lens and deflection systems with superimposed fields. Optik 64 (1983) 341
    • (1983) Optik , vol.64 , pp. 341
    • Chen, Z.W.1    Qui, P.Y.2    Wang, J.K.3
  • 5
    • 0001207242 scopus 로고    scopus 로고
    • The electrostatic moving objective lens and optimized deflection systems for microcolumns
    • Thomson MGR: The electrostatic moving objective lens and optimized deflection systems for microcolumns. J. Vac. Sci. Technol. B 14 (1996) 3802-3087
    • (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 3802-3087
    • Thomson, M.G.R.1
  • 6
    • 0024954439 scopus 로고
    • Scanning electron microscope with a single pole-piece lens
    • Kolarík V, Müllerová I, Lenc M: Scanning electron microscope with a single pole-piece lens. Scanning Microscopy 3 (1989) 1003-1008
    • (1989) Scanning Microscopy , vol.3 , pp. 1003-1008
    • Kolarík, V.1    Müllerová, I.2    Lenc, M.3
  • 7
    • 0031813728 scopus 로고    scopus 로고
    • An On-pole-piece-tip deflector for high resolution low voltage electron scanning microscopes
    • Zhao Y, Khursheed A: An On-pole-piece-tip deflector for high resolution low voltage electron scanning microscopes. Scanning 20 (1998) 10-16
    • (1998) Scanning , vol.20 , pp. 10-16
    • Zhao, Y.1    Khursheed, A.2
  • 9
    • 0000837157 scopus 로고
    • Numerical Analysis of Electron Beam Lithography System. Part III: Calculation of the Optical Properties of Electron Focusing Systems and Dual-Channel Deflection Systems with Combined Magnetic and Electrostatic Fields
    • Chu HC, Munro E: Numerical Analysis of Electron Beam Lithography System. Part III: Calculation of the Optical Properties of Electron Focusing Systems and Dual-Channel Deflection Systems with Combined Magnetic and Electrostatic Fields. Optik 61 (1982) 122-145
    • (1982) Optik , vol.61 , pp. 122-145
    • Chu, H.C.1    Munro, E.2
  • 10
    • 0020103888 scopus 로고
    • Numerical Analysis of Electron Beam Lithography Systems. Part I: Computation of fields in magnetic deflectors
    • Munro E, Chu HC: Numerical Analysis of Electron Beam Lithography Systems. Part I: Computation of fields in magnetic deflectors. Optik 60 (1982) 371-390
    • (1982) Optik , vol.60 , pp. 371-390
    • Munro, E.1    Chu, H.C.2
  • 11
    • 0023997783 scopus 로고
    • On the design of electron beam deflection system
    • Lencová B: On the design of electron beam deflection system. Optik 79 (1988) 1-12
    • (1988) Optik , vol.79 , pp. 1-12
    • Lencová, B.1

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.