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Surface Science

Volumn 433, Issue , 1999, Pages 512-516

Cu induced step bunching on a Si(111) vicinal surface studied by reflection electron microscopy

(4) Takahashi, Y a Minoda, H a Tanishiro, Y a Yagi, K a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COPPER; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; ELECTRON MICROSCOPY; ELECTRON REFLECTION; LOW ENERGY ELECTRON DIFFRACTION; SURFACES;

REFLECTION ELECTRON MICROSCOPY; SURFACE RECONSTRUCTION; SURFACE STEPS;

SILICON;

EID: 0033318132 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(99)00464-1 Document Type: Article

Times cited : (11)

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