Threshold behavior in the formation of nanoscale silicon particles prepared by sputtering

Nanostructured Materials

Volumn 11, Issue 8, 1999, Pages 1111-1122

  Pearson, D H ^a   Edelstein, A S ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; GRANULAR MATERIALS; MAGNETRON SPUTTERING; MORPHOLOGY; PRESSURE EFFECTS; SEPARATION; SILICON; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS PHASE; CRYSTALLINE PHASE; GRANULAR FILMS;

NANOSTRUCTURED MATERIALS;

EID: 0033300282     PISSN: 09659773     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0965-9773(99)00401-8     Document Type: Article

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