Low-temperature preparation of poly-Si thin-films having giant grains

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 177-182

  Yeh, Wen Chang ^a   Matsumura, Masakiyo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITANCE; EXCIMER LASERS; FILM PREPARATION; GRAIN GROWTH; IRRADIATION; LASER PULSES; LOW TEMPERATURE OPERATIONS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; THIN FILMS;

LIGHT INTENSITY; POLYCRYSTALLINE SILICON; THERMAL ENERGY;

SEMICONDUCTING SILICON;

EID: 0033299966     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-177     Document Type: Article

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