The formation and behavior of particles in silane discharges

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 3-12

  Gallagher, Alan ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; FILM GROWTH; HYDROGENATION; MATHEMATICAL MODELS; PARTICLES (PARTICULATE MATTER); PRESSURE; STRUCTURE (COMPOSITION);

ELECTRODE GAP; PARTICLE GROWTH; PLASMA CHEMISTRY MODEL;

SILANES;

EID: 0033298869     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-3     Document Type: Article

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