Stable amorphous silicon and improved microcrystalline silicon by photon-assisted electron cyclotron resonance chemical vapor deposition

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 49-54

  Song, Young J ^a   Anderson, Wayne A ^a  

^a UNIVERSITY AT BUFFALO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; DEGRADATION; ELECTRIC PROPERTIES; ELECTRON CYCLOTRON RESONANCE; PHOTONS; PHOTOVOLTAIC CELLS; RAMAN SPECTROSCOPY; SOLAR CELLS; THIN FILM TRANSISTORS; TUNGSTEN;

CRYSTALLINITY; MICROCRYSTALLINE SILICON; PHOTON ASSIST PROCESS;

AMORPHOUS SILICON;

EID: 0033297459     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-49     Document Type: Article

References (7)

1. F. R. Jeffrey, H. R. Shanks, and G. C. Danielson, J. Appl. Phys. 50, 7034 (1979).
2. W. Paul, Solid State Comm. 34, 283 (1980).
3. X. Liu, E. Iwaniczko, R. O. Pohl, and R. S. Crandall, Mat. Res. Soc. Symp. Proc. 507, 595 (1998).
4. F. Finger, P. Hapke, M. Luyberg, R. Carius, H. Wager, and M. Scheib, Appl. Phys. Lett. 65, 2588 (1994).
5. M. Kitagawa, S. Ishihara, K. Setsune, Y. Manabe, and T. Hirao, Jpn. J. Appl. Phys. 26, L231 (1987).
6. B. Jagannathan, R. L. Wallace, and W. A. Anderson, J. Vac. Sci. and Tech. A 16, 2751 (1998).
7. P. J. Zanzucchi, C. R. Wronski, and D. E. Carlspn, J. Appl. Phys. 48, 5227 (1977).