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Volumn 7, Issue 4, 1999, Pages 265-267

High-resolution AMLCD made with a-Si:H TFTs and an Al gate and IZO structure

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; THIN FILM TRANSISTORS;

EID: 0033296354     PISSN: 10710922     EISSN: None     Source Type: Journal    
DOI: 10.1889/1.1985293     Document Type: Article
Times cited : (3)

References (8)
  • 1
    • 0342921974 scopus 로고    scopus 로고
    • Low-cost high-display-quality TFT-LCD process
    • C W Kim, J H Lee, H R Nam, et al, "Low-cost high-display-quality TFT-LCD process," EuroDisplay '96 Digest, 591-594 (1996).
    • (1996) EuroDisplay '96 Digest , pp. 591-594
    • Kim, C.W.1    Lee, J.H.2    Nam, H.R.3
  • 2
    • 6744274408 scopus 로고
    • A high-aperture-ratio 3-in -diagonal VGA a-Si light valve with pixel/data and pixel/gate line over-lapping
    • M Sakamoto, T Ukita, A M eda, et al, "A high-aperture-ratio 3-in -diagonal VGA a-Si light valve with pixel/data and pixel/gate line over-lapping," SID Intl Symp Digest Tech Papers, 681-684 (1966).
    • (1966) SID Intl Symp Digest Tech Papers , pp. 681-684
    • Sakamoto, M.1    Ukita, T.2    Eda, A.M.3
  • 4
    • 0004926713 scopus 로고    scopus 로고
    • High-Information-Content Color 16.3-in. Desktop AMLCD with 15.7 Million a-Si H TFTs
    • K Schleupen, P Alt, P Andry, et al, "High-Information-Content Color 16.3-in. Desktop AMLCD with 15.7 Million a-Si H TFTs," Asia Display '98, 187-191 (1998).
    • (1998) Asia Display '98 , pp. 187-191
    • Schleupen, K.1    Alt, P.2    Andry, P.3
  • 5
    • 0031192865 scopus 로고    scopus 로고
    • Effects of Nd content in Al thin films on hillock formation
    • T Onishi, E Iwamura, and K Takagi, "Effects of Nd content in Al thin films on hillock formation," J Vac Technol A. 15(4), 2339-2348 (1997).
    • (1997) J Vac Technol A , vol.15 , Issue.4 , pp. 2339-2348
    • Onishi, T.1    Iwamura, E.2    Takagi, K.3
  • 6
    • 0032068205 scopus 로고    scopus 로고
    • Evaluation of Al(Nd) alloy f lms for application to thin-film-transistor liquid-crystal displays
    • H Takatsuji, E G Colgan, C Cabrai, Jr., et al, "Evaluation of Al(Nd) alloy f lms for application to thin-film-transistor liquid-crystal displays," IBM J Res and Develop 42(314), 501-508 (1998).
    • (1998) IBM J Res and Develop , vol.42 , Issue.314 , pp. 501-508
    • Takatsuji, H.1    Colgan, E.G.2    Cabrai Jr., C.3
  • 7
    • 0032311799 scopus 로고    scopus 로고
    • Characterization of transparent conductors in indium zinc oxide and their application to thin-film-transistor liquid-crystal displays
    • H Takatsuji, T Hiromori, K Tsujimoto, et al, "Characterization of transparent conductors in indium zinc oxide and their application to thin-film-transistor liquid-crystal displays," Mat Res Soc Symp Proc 508, 315-320 (1998).
    • (1998) Mat Res Soc Symp Proc , vol.508 , pp. 315-320
    • Takatsuji, H.1    Hiromori, T.2    Tsujimoto, K.3
  • 8
    • 0032068679 scopus 로고    scopus 로고
    • Thin-film-transistor process characterization test structures
    • E G Colgan, R J Polastre, M Takeichi, et al, "Thin-film-transistor process characterization test structures," IBM J Res and Dev 42(3/4), 481-490 (1998).
    • (1998) IBM J Res and Dev , vol.42 , Issue.3-4 , pp. 481-490
    • Colgan, E.G.1    Polastre, R.J.2    Takeichi, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.