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Journal of Electronic Materials

Volumn 28, Issue 12, 1999, Pages 1452-1456

Optical characterization of hydrogenated amorphous silicon thin films deposited at high rate

(4) Lin, S H a Chan, Y C a Webb, D P a Lam, Y W a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; APPROXIMATION THEORY; HYDROGENATION; ITERATIVE METHODS; LIGHT ABSORPTION; LIGHT TRANSMISSION; NONLINEAR EQUATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SEMICONDUCTING SILICON; THIN FILMS;

BRUGGEMANN EFFECTIVE MEDIUM (EMA) APPROXIMATION; OPTICAL GAP;

SEMICONDUCTING FILMS;

EID: 0033279979 PISSN: 03615235 EISSN: None Source Type: Journal
DOI: 10.1007/s11664-999-0140-9 Document Type: Article

Times cited : (10)

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