Minimizing damage during focused-ion-beam induced desorption of hydrogen

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2443-2446

  Fuhrmann, H ^a   Candel, A ^a   Dobeli M ^a   Muhle R ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033273242     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591108     Document Type: Article

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