A study on the characteristics of the interlayer low dielectric polyimide during cl-based plasma etching of aluminum

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 4, 1999, Pages

  Kim, Sang Hoon ^a   Moon, Ho Sung ^a   Ahn, Jinho ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033271557     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

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