Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2795-2796

  Zhao, Yan ^a   Khursheed, Anjam ^b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033263053     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591068     Document Type: Article

References (11)

1. H. Ohiwa, E. Goto, and A. Omo, Electron. Commun. Jpn. 54B, 44 (1971).
2. H. C. Pfeiffer and G. O. Langner, J. Vac. Sci. Technol. 19, 1058 (1981).
3. W. Stickel, G. O. Langner, and P. F. Petric, Microcircuit Eng. 17, 25 (1992).
4. Z. W. Chen, P. Y. Qui, and J. K. Wang, Optik (Stuttgart) 64, 341 (1983).
5. M. G. R. Thomson, J. Vac. Sci. Technol. B 14, 3802 (1996).
6. V. Kolarík, I. Müllerová, and M. Lenc, Scanning Microsc. 3, 1003 (1989).
7. Y. Zhao and A. Khursheed, Scanning 20, 10 (1998).
8. E. Munro and H. C. Chu, Optik (Stuttgart) 61, 1 (1982).
9. E. Munro and H. C. Chu, Optik (Stuttgart) 60, 371 (1982).
10. A. Khursheed, Khursheed electron optic software (KEOS) package, National University of Singapore, Singapore 119260, Singapore.
11. E. Munro and H. C. Chu, Optik (Stuttgart) 61, 122 (1982).