Holographic characterization of chain photopolymerization

Journal of the Optical Society of America B: Optical Physics

Volumn 16, Issue 8, 1999, Pages 1213-1219

  Engin, D ^a   Kewitsch, A S ^a   Yariv, A ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; MATHEMATICAL MODELS; MONOMERS; PARAMETER ESTIMATION; PHOTOPOLYMERIZATION; REACTION KINETICS;

CHAIN PHOTOPOLYMERIZATION; DIFFUSION CONSTANT; MULTIFUNCTIONAL ACRYLATES; TROMMSDORFF EFFECT;

HOLOGRAPHY;

EID: 0033244287     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.16.001213     Document Type: Article

References (11)

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2. A. S. Kewitsch and A. Yariv, "Nonlinear-optical properties of photoresists for projection lithography," Appl. Phys. Lett. 68, 455-457 (1996); A. S. Kewitsch and A. Yariv, "Self-focusing arid self-trapping of optical beams upon photopolymerization," Opt. Lett. 21, 24-26 (1996).
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