Effect of ZnO film thicknesses on the adhesive strength of electroless Cu deposits

Chemistry Letters

Volumn , Issue 1, 1999, Pages 11-12

  Sun, Ren De ^a   Tryk, Donald A ^a   Hashimoto, Kazuhito ^b   Fujishima, Akira ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033238885     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.1999.11     Document Type: Article

References (8)

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8. H. Yoshiki, K. Hashimoto, and A. Fujishima, J. Electrochem. Soc:, 145, 1430 (1998).