X-ray diffraction and X-ray photoelectron spectra of Fe-Cr-N films deposited by DC reactive sputtering

Journal of Materials Science

Volumn 34, Issue 18, 1999, Pages 4623-4628

  Peng, D L ^a   Sumiyama, K ^a   Oku, M ^a   Konno, T J ^a   Wagatsuma, K ^a   Suzuki, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; MAGNETIC ANISOTROPY; MAGNETRON SPUTTERING; NITROGEN; OXIDATION RESISTANCE; OXYGEN; SPUTTER DEPOSITION; TEMPERATURE; TERNARY SYSTEMS; TEXTURES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM X RAY DIFFRACTOMETER; GRAPHITE MONOCHROMATOR; IRON CHROMIUM NITROGEN ALLOYS; SEEMANN-BOHLIN FOCUSING PRINCIPLE; SURFACE SCIENCE LABORATORIES MODEL; VIBRATING SAMPLE MAGNETOMETER; X RAY DIFFRACTION MEASUREMENTS;

IRON ALLOYS;

EID: 0033189844     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004638700680     Document Type: Article

References (10)

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