Microstructure and deposition characteristics of κ-Al2O3

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Ruppi, S ^a   Larsson, A ^a  

^a SECO TOOLS AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CATALYSIS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; DOPING (ADDITIVES); HYDROGEN SULFIDE; MULTILAYERS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

CRYSTALLINITY; HOT WALL REACTOR;

COATINGS;

EID: 0033188007     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999843     Document Type: Article

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