IV - VI semiconductor growth on silicon substrates and new mid-infrared laser fabrication methods

Spectrochimica Acta - Part A: Molecular and Biomolecular Spectroscopy

Volumn 55, Issue 10, 1999, Pages 1999-2005

  McCann, Patrick J ^a   Chao, I Na ^a   Sachar, Harpreet ^a   McAlister, Denton ^a   Li, Chun Pang ^a   Fang, Xiao Ming ^a   Wu, Huizhen ^a   Namjou, Khosrow ^a  

^a UNIVERSITY OF OKLAHOMA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; CRYSTAL STRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED RADIATION; LASER APPLICATIONS; LIQUID PHASE EPITAXY; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

BARIUM FLUORIDE; FOURIER TRANSFORM INFRARED TRANSMISSION MEASUREMENTS; HIGH RESOLUTION X RAY DIFFRACTION; MID INFRARED LASER FABRICATION METHODS;

SEMICONDUCTOR GROWTH;

EID: 0033187652     PISSN: 13861425     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1386-1425(99)00071-2     Document Type: Article

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