Characterization of damaged layer using AC surface photovoltagein silicon wafers

Japanese Journal of Applied Physics

Volumn 32, Issue 9 R, 1993, Pages 3962-3963

  Kohmoto, Osamu ^a   Araki, Satoru ^b   Alexander, Chester ^c  

^a OKAYAMA UNIVERSITY   (Japan)

^b TDK CORPORATION   (Japan)

^c UNIVERSITY OF ALABAMA   (United States)

Author keywords

Anisotropy field; Cobalt; Evaporation; Fee; Ferromagnetic resonance; Film; Hcp; Linewidth; Resonance field

Indexed keywords

ANISOTROPY; COBALT; CRYSTAL STRUCTURE; DEPOSITION; EVAPORATION; FILM PREPARATION; MAGNETIC FIELD EFFECTS; MAGNETIZATION; SUBSTRATES; THICK FILMS; X RAY ANALYSIS;

COBALT BASED FILMS; GYROMAGNETIC RATIO; RESONANCE FIELD; SATURATION MAGNETIZATION; UNIAXIAL ANISOTROPY FIELD;

FERROMAGNETIC RESONANCE;

EID: 0027659780     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.32.3962     Document Type: Article

References (8)

1. J. O. Artman: J. Appl. Phys. 61 (1987) 3137.
2. O. Kohmoto and C. Alexander, Jr.: J. Magn. Magn. Mater. 116 (1992) 405.
3. O. Kohmoto and S. Araki: Jpn. J. Appl. Phys. 31 (1992) L1754.
4. O. Kohmoto and C. Alexander, Jr.: Jpn. J. Appl. Phys. 31 (1992) 2101.
5. W. D. Doyle and P. J. Flanders: Proc. Int. Conf. Magnetism (1964) p. 751.
6. O. Kohmoto, C. Alexander, Jr., O. Kubo and J. C. Cates: Jpn. J. Appl. Phys. 31 (1992) 788 [Errata; 31 (1992) 2317].
7. C. Chappert, K. Le Dang, P. Beauvillain, H. Hurdequint and D. Renard: Phys. Rev. B 34 (1986) 3192.
8. A. P. J. Meyer and G. Asch: J. Appl. Phys. 32 (1961) 330S.