Fourier transform infrared characterization of moisture absorption in SiOF films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 8 B, 1999, Pages 4642-4647

  Chang, Wai Jyh ^a   Houng, Mau Phon ^a   Wang, Yeong Her ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Dielectric film; High temperature annealing; Hydrophobic surface; Liquid phase deposited fluorinated silicon oxide; Moisture absorption; Water absorption change

Indexed keywords

ABSORPTION; ANNEALING; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIELECTRIC PROPERTIES; FILM GROWTH; FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INORGANIC ACIDS; MOISTURE; SILICON COMPOUNDS;

HYDROFLUOSILICIC ACID; HYDROPHOBICITY; LIQUID PHASE DEPOSITED FLUORINATED SILICON OXIDE; MOISTURE RESISTANCE;

DIELECTRIC FILMS;

EID: 0033173913     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4642     Document Type: Article

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