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Volumn 7, Issue 2, 1999, Pages 197-205
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Relationship between electrical activity and grain boundary structural configuration in polycrystalline silicon
a,c a b b a |
Author keywords
[No Author keywords available]
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Indexed keywords
CHARGE CARRIERS;
CRYSTAL IMPURITIES;
CRYSTAL LATTICES;
CRYSTAL ORIENTATION;
ELECTRIC PROPERTIES;
ELECTRON BEAMS;
ELECTRON DIFFRACTION;
ELECTRON ENERGY LEVELS;
GRAIN BOUNDARIES;
POLYCRYSTALLINE MATERIALS;
SCANNING ELECTRON MICROSCOPY;
THERMAL EFFECTS;
CARRIER RECOMBINATION;
COINCIDENCE SITE LATTICE;
ELECTRON BACKSCATTERED DIFFRACTION PATTERN;
ELECTRON BEAM INDUCED CURRENT TECHNIQUE;
GRAIN BOUNDARY INCLINATION;
MISORIENTATION;
ORIENTATION IMAGING MICROSCOPE SYSTEM;
SEMICONDUCTING SILICON;
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EID: 0033171751
PISSN: 09277056
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1008796005240 Document Type: Article |
Times cited : (74)
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References (28)
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