Control of process uniformity by using electron cyclotron resonance plasma produced by multiannular antenna

Applied Physics Letters

Volumn 68, Issue 11, 1996, Pages 1476-1478

  Yasaka, Yasuyoshi ^a   Nakamura, Tomokazu ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343043735     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116259     Document Type: Article

References (7)

1. S. Matsuo and Y. Adachi, Jpn. J. Appl. Phys. 21, L4 (1982).
2. R. Hidaka, T. Yamaguchi, N. Hirotsu, T. Ohshima, R. Koga, M. Tanaka, and Y. Kawai, Jpn. J. Appl. Phys. 32, 174 (1993).
3. M. Pichot and A. Durandet, Rev. Sci. Instrum. 59, 1072 (1988).
4. N. Sato, S. Iizuka, Y. Nakagawa, and T. Tsukada, Appl. Phys. Lett. 62, 1469 (1993).
5. N. Shida, T. Inoue, H. Kokai, Y. Sakamoto, W. Miyasawa, S. Den, and Y. Hayashi, Jpn. J. Appl. Phys. 32, L1635 (1993).
6. A. Hatta, M. Kubo, Y. Yasaka, and R. Itatani, Jpn. J. Appl. Phys. 31, 1473 (1992).
7. A. Hatta, Y. Yasaka, and R. Itatani, Plasma Sources Sci. Technol. 1, 13 (1992).