Understanding CD variations in optical lithography using predictive modeling techniques

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 35-39

  Flagello, D G ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COHERENT LIGHT; COMPUTER SIMULATION; FINITE ELEMENT METHOD; FOCUSING; LIGHTING; MATHEMATICAL MODELS; MONTE CARLO METHODS; ULTRAVIOLET RADIATION;

ACROSS-FIELD LINEWIDTH VARIATION (AFLV); CRITICAL DIMENSIONS (CD);

PHOTORESISTS;

EID: 0033132112     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00010-6     Document Type: Article

References (2)

1. 1. D. Flagello and B.Geh, "Lithographic lens testing: analysis of measured aerial images, interferometric data and photoresist measurements", SPIE 2726, 788-798 (1996)
2. 2. P. Dirksen, "Latent image metrology for production wafer steppers", SPIE 2440, p.701-710