A special method to create gratings of variable line density by low voltage electron beam lithography

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 49-52

  Niemann, B ^a   Wilhein, T ^a   Schliebe, T ^a   Plontke, R ^b   Fortagne, O ^b   Stolberg, I ^b   Zierbock, M ^b  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b JENOPTIK Technologie GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; MONOCHROMATORS; SUBSTRATES; ULTRAVIOLET RADIATION; X RAY MICROSCOPES; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

OFF AXIS REFLECTING X RAY ZONE PLATE; OFF AXIS TRANSMISSION ZONE PLATE; PROXIMITY EFFECT; SOFT X RAYS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029771223     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00192-1     Document Type: Article

References (10)

1. Bruenger, W. et al. Microelectronic Engineering 27 (1995) 135
2. Niemann, B. et al., Applied Optics 15 (1976) 1883
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4. Niemann, B. et al, Opt.Comm. 12 (1974) 160
5. Schmahl, G. and Rudolph, D. Prog. Optics 14 (1976) 195
6. Rudolph, D. et al., X-ray Microscopy, Springer (1984) 192
7. Wilhein, T. et al., X-ray Microscopy iV, eds. Erko, A.I. and Aristov, V.V., Bogorodski Pechatnik Publishing Co., Chemogolovka, Russia, (1995)
8. Hoschek, J. and Lasser, D. "Grundlagen der geometrischen Datenverarbeitung"(1992) B.G. Teubner Stuttgart
9. Rymell, L., Berglund, M. and Hertz, H.M., Appl.Phys.Lett. 66, 2625 (1995)
10. Wilhein, T., Niemann, B., Rymell, L. and Hertz, H.M., to be published