Sub - 35 nm metal gratings fabricated using PMMA with high contrast developers

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 207-210

  Thoms, S ^a   Macintyre, D S ^a   McCarthy, M ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; FABRICATION; METALS; POLYMETHYL METHACRYLATES; SOLUTIONS;

HIGH CONTRAST DEVELOPERS; METAL GRATINGS;

LITHOGRAPHY;

EID: 4243872623     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00047-1     Document Type: Article

References (4)

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3. G H Bernstein, D A Hill and L Wen-Ping J. Appl. Phys. 71(8), 4066 (1992)
4. DRS Cumming, S Thorns, SP Beaumont and JMR Weaver, J. Vac. Sci. Technol. B14 6 (1996) 4115-8