Lattice strain in sputter-deposited Fe-N-Si films: Effects of interstitial mobility

IEEE Transactions on Magnetics

Volumn 35, Issue 3 PART 2, 1999, Pages 2024-2028

  Uchiyama, K ^a,b   O'Handley, R C ^a  

^a TDK CORPORATION   (Japan)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Fe n si films; Mobile interstitials; Thin films strain

Indexed keywords

IRON ALLOYS; MAGNETIC ANISOTROPY; MAGNETOSTRICTION; NITROGEN; SILICON; SPUTTER DEPOSITION; STRAIN; X RAY DIFFRACTION;

INTERSTITIAL MOBILITY; LATTICE STRAIN; THIN FILMS STRAIN;

MAGNETIC FILMS;

EID: 0033121862     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.764906     Document Type: Article

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