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Applied Physics A: Materials Science and Processing

Volumn 68, Issue 4, 1999, Pages 399-402

True atomic resolution under ambient conditions obtained by atomic force microscopy in the contact mode

(4) Schimmel, Th a,b Koch, Th a Kuppers J a Lux Steiner, M c,d

a UNIVERSITY OF BAYREUTH (Germany)

b UNIVERSITY OF KARLSRUHE (Germany)

c UNIVERSITY OF KONSTANZ (Germany)

d HAHN MEITNER INSTITUT (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELECTRONIC STRUCTURE; LATTICE CONSTANTS; MOLECULAR DYNAMICS; MONOLAYERS; NIOBIUM COMPOUNDS; VAN DER WAALS FORCES;

ATOMIC RESOLUTION; CONTACT MODE; MICROSCOPIC DEFECTS;

ATOMS;

EID: 0033116238 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050912 Document Type: Article

Times cited : (25)

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