Perpendicular Co-Cr thin films using a new sputtering plasma generating apparatus

Journal of Magnetism and Magnetic Materials

Volumn 193, Issue 1-3, 1999, Pages 114-116

  Kadokura, S ^a   Naoe, Masahiko ^b  

^a FTS Corporation   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Isolated ferromagnetic areas; Paramagnetic matrix; Perpendicular coercivity; Plasma generating unit; Thin films

Indexed keywords

ARGON; CHROMIUM; COBALT COMPOUNDS; COERCIVE FORCE; CRYSTALLINE MATERIALS; ETCHING; FERROMAGNETISM; FILM GROWTH; PARAMAGNETISM; SPUTTER DEPOSITION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

ISOLATED FERROMAGNETIC AREAS; PARAMAGNETIC MATRIX; SPUTTERING PLASMA GENERATING APPARATUS;

MAGNETIC THIN FILM DEVICES;

EID: 0033100618     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(98)00411-9     Document Type: Article

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