The kinetics of indium/amorphous-selenium multilayer thin film reactions

Journal of Materials Research

Volumn 14, Issue 3, 1999, Pages 771-779

  Lu, K ^a,c   Sui, M L ^a   Perepezko, J H ^a   Lanning, B ^b  

^a University of Wisconsin Madison   (United States)

^b Lockheed Martin Aerospace   (United States)

^c INSTITUTE OF METAL RESEARCH   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; DIFFERENTIAL SCANNING CALORIMETRY; HEAT TREATMENT; INTERFACES (MATERIALS); MULTILAYERS; REACTION KINETICS; SEMICONDUCTING INDIUM; SEMICONDUCTING SELENIUM; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

MULTILAYER MODULATION WAVELENGTH;

OPTICAL FILMS;

EID: 0033097522     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0103     Document Type: Article

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