Inverse model-based real-time control for temperature uniformity of RTCVD

IEEE Transactions on Semiconductor Manufacturing

Volumn 12, Issue 1, 1999, Pages 87-101

  Theodoropoulou, Artemis ^b   Zafiriou, Evanghelos ^a,c   Adomaitis, Raymond A ^c  

^a IEEE   (United States)

^b OSIsoft Inc   (United States)

^c UNIVERSITY OF MARYLAND   (United States)

Author keywords

Internal model control; Process control; RTCVD

Indexed keywords

ALGEBRA; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CONTROL SYSTEM ANALYSIS; CONTROL SYSTEM SYNTHESIS; FEEDBACK CONTROL; MATHEMATICAL MODELS; OPTIMAL CONTROL SYSTEMS; ORDINARY DIFFERENTIAL EQUATIONS; PARAMETER ESTIMATION; PROCESS ENGINEERING; TEMPERATURE MEASUREMENT;

HIRSCHORN INVERSE MODELS; INTERNAL MODEL CONTROL (IMC) STRUCTURES; RAPID THERMAL CHEMICAL VAPOR DEPOSITION (RTCVD) PROCESS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033078356     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.744530     Document Type: Article

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