Plasma sources and characterization in the r.f. test facility

Surface and Coatings Technology

Volumn 112, Issue 1-3, 1999, Pages 52-55

  Yang, J G ^a   Kim, W S ^a   Chung, Y S ^a   Choi, J H ^a   Yoon, N S ^a   You, K I ^a   Choi, J W ^a   Kim, B C ^a   Kyum, M C ^a   Na, H K ^a   Hong, J ^a   Lee, G S ^a   Hwang, S M ^a   Huh, J H ^b   Ryu, C M ^b   Sim, J H ^c   Son, D C ^c   Hong, S J ^c  

^a Korea Basic Science Institute (KBSI)   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c Kyungpook National University   (South Korea)

Author keywords

Hanbit; ICP; RFTF

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; MAGNETIC FIELD EFFECTS; MAGNETOOPTICAL DEVICES; MIRRORS; PLASMA DENSITY; PLASMA DIAGNOSTICS; TEST FACILITIES;

HANBIT DEVICES; INDUCTIVELY COUPLED PLASMA;

PLASMA SOURCES;

EID: 0033077683     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00740-3     Document Type: Article

References (6)

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