Electrochemical behavior of Cr2O3/Fe2O3 artificial passive films studied by in situ XANES

Journal of the Electrochemical Society

Volumn 145, Issue 3, 1998, Pages 791-801

  Schmuki, P ^a,e,f   Virtanen, S ^a   Isaacs, H S ^b,e   Ryan, M P ^b,e   Davenport, A J ^c,e   Bohni H ^a,e   Stenberg, T ^d  

^a ETH ZURICH   (Switzerland)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF MANCHESTER   (United Kingdom)

^d TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

^e ELECTROCHEMICAL SOCIETY   (Switzerland)

^f EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC POLARIZATION; CHROMIUM COMPOUNDS; IRON OXIDES; SPUTTER DEPOSITION; X RAY SPECTROSCOPY;

OXIDE FILMS; PASSIVE FILMS; X RAY ABSORPTION NEAR EDGE SPECTROSCOPY;

PASSIVATION;

EID: 0032022149     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838347     Document Type: Article

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