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Volumn 149, Issue 3, 1999, Pages 319-324

Structural modifications in silicon irradiated successively by N+ and He+ or Ar8+ and He+ ions

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLINE MATERIALS; DEFECTS; INTERFACES (MATERIALS); ION BEAMS; ION IMPLANTATION; IONS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0033076491     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00913-6     Document Type: Article
Times cited : (3)

References (10)
  • 4
    • 19544377228 scopus 로고
    • Proceedings of the 10th International Conference on Ion Implantation Technology
    • Catania
    • P.A. Stolk, H.J. Gossmann, D.J. Eaglesham, J.M. Poate, Proceedings of the 10th International Conference on Ion Implantation Technology, Catania, 1994, Nucl. Instr. and Meth. B 96 (1995) 187.
    • (1994) Nucl. Instr. and Meth. B , vol.96 , pp. 187
    • Stolk, P.A.1    Gossmann, H.J.2    Eaglesham, D.J.3    Poate, J.M.4
  • 10
    • 0039613044 scopus 로고    scopus 로고
    • Dubna JINR preprint P14-97-199 (in Russian)
    • V.F. Reutov, A.S. Sokhatsky, Dubna, 1997, JINR preprint P14-97-199 (in Russian).
    • (1997)
    • Reutov, V.F.1    Sokhatsky, A.S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.