Adhesion improvement of diamond coating on silicon nitride substrate

Surface and Coatings Technology

Volumn 112, Issue 1-3, 1999, Pages 199-203

  Itoh, Hideaki ^a   Lee, Sung Soo ^a   Sugiyama, Kazuyoshi ^a   Iwahara, Hiroyasu ^a   Tsutsumoto, Takahiro ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b Western Hiroshima Prefecture Industrial Research Institute   (Japan)

Author keywords

Adhesion; Cutting tool; Diamond; Silicon nitride

Indexed keywords

ADHESION; CARBON MONOXIDE; CHEMICAL BONDS; COMPRESSION TESTING; CUTTING TOOLS; HYDROGEN; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; SILICON NITRIDE; STRESS RELAXATION; SUBSTRATES;

COMPRESSION TOPPLE TESTS;

DIAMOND FILMS;

EID: 0033075137     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00768-3     Document Type: Article

References (7)

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7. T. Tsutsumoto, A. Nakao, H. Matsubara, in: S. Saito, n. Fujimori, O. Fukunaga, M. Kamo, K. Kabashi, M. Yoshikawa (Eds.), Advances in New Diamond Science and Technology, NYU, Tokyo, 1994, p. 763.