Adherent diamond coating on silicon nitride substrate

Journal of the Ceramic Society of Japan

Volumn 104, Issue 12, 1996, Pages 1137-1142

  Itoh, Hideaki ^a   Shimura, Sadanori ^a   Iwahara, Hiroyasu ^a   Sakamoto, Hiromichi ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b Sigma Coating Engineering   (Japan)

Author keywords

Adherence; Cutting tool; Diamond film; Microwave plasma CVD; Silicon nitride substrate

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATING TECHNIQUES; DIAMOND CUTTING TOOLS; DIAMOND FILMS; ETCHING; MECHANICAL TESTING; MILLING (MACHINING); POROUS MATERIALS; SERVICE LIFE; SILICON NITRIDE; SUBSTRATES; ULTRASONIC CUTTING;

ADHERENT DIAMOND COATING; DIAMOND MICROFLAWING; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;

ABRASIVE COATINGS;

EID: 0030384106     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.104.1137     Document Type: Article

References (8)

1. P. M. Stephan, Am. Ceram. Soc. Bull., 71, 1623-29 (1992).
2. S. Söderberg, A. Gerendas and M. Sjöstrand, Vacuum, 41, 1317-21 (1990).
3. R. Polini, G. Marcheselli and E. Traversa, J. Am. Ceram. Soc., 77, 2034-48 (1994).
4. New Diamond, 11 [2], 46-49 (1995).
5. H. Itoh, T. Osaki, H. Iwahara and H. Sakamoto, J. Mater. Sci., 26, 3763-68 (1991).
6. H. Itoh, T. Nakamura and H. Iwahara, J. Cryst. Growth, 108, 647-54 (1991).
7. H. Itoh, T. Nakamura, H. Iwahara and H. Sakamoto, J. Mater. Sci., 29, 1404-10 (1994).
8. H. Itoh, S. Shimura, K. Sugiyama, H. Iwahara and H. Sakamoto, J. Am. Ceram. Soc., in press.