Residual stress in diamond coatings by synchrotron radiation XRD

Materials Science Forum

Volumn 228-231, Issue PART 2, 1996, Pages 451-456

  Scardi, P ^a   Leoni, M ^a   Sessa, V ^b   Terranova, M L ^b   Cappuccio, G ^c,d  

^a UNIVERSITY OF TRENTO   (Italy)

^b UNIVERSITY OF ROME TOR VERGATA   (Italy)

^c CNR   (Italy)

^d INFN LABORATORI NAZIONALI DI FRASCATI   (Italy)

Author keywords

Diamond; HFCVD; Residual Stress; Synchrotron Radiation; Thin Films; XRD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; DIFFRACTOMETERS; INDUSTRIAL APPLICATIONS; INTERFACES (MATERIALS); RESIDUAL STRESSES; STRAIN MEASUREMENT; STRESS ANALYSIS; SYNCHROTRON RADIATION; THERMAL STRESS; THIN FILMS; X RAY DIFFRACTION;

DIAMOND COATINGS; HOT FILAMENT CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESS ANALYSIS;

DIAMOND FILMS;

EID: 0030385401     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.228-231.451     Document Type: Article

References (10)

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