Structural and chemical characterization of as-deposited microcrystalline indium oxide films prepared by dc reactive magnetron sputtering

Journal of Electronic Materials

Volumn 28, Issue 1, 1999, Pages 26-34

  Xirouchaki, C ^a,b   Moschovis, K ^a   Chatzitheodoridis, E ^a   Kiriakidis, G ^a   Boye, H ^b   Morgen, P ^b  

^a UNIVERSITY OF CRETE   (Greece)

^b UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

Author keywords

Auger electron spectroscopy (AES); Dc reactive magnetron sputtering; Energy dispersive x ray analysis (EDX); Indium oxide; Transmission electron microscopy (TEM); UV photoreduction

Indexed keywords

CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON DIFFRACTION; FILM PREPARATION; MAGNETRON SPUTTERING; SEMICONDUCTING GLASS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTING SILICON; STOICHIOMETRY; SURFACE PROPERTIES; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

MICROCRYSTALLINE INDIUM OXIDE FILMS;

SEMICONDUCTING FILMS;

EID: 0032761533     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-999-0190-z     Document Type: Article

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