Growth and fractal scaling nature of copper thin films on TiN surface by metal organic chemical vapor deposition from hexafluoroacethylacetonate Cu(I) vinyltrimethylsilane

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 1995-2000

  Park, Young Bae ^a   Rhee, Shi Woo ^a   Hong, Jae Hwa ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Research Institute of Industrial Science and Technology (RIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008837180     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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