Investigation of strain distribution in LOCOS structures by dynamical simulation of LACBED patterns

Ultramicroscopy

Volumn 80, Issue 3, 1999, Pages 193-201

  Wu, Feng ^a   Armigliato, Aldo ^a   Balboni, Roberto ^b   Frabboni, Stefano ^b  

^a CNR   (Italy)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

Author keywords

Dynamical simulations; LACBED; LOCOS structures; Strain

Indexed keywords

COMPUTER SIMULATION; CRYSTAL LATTICES; CRYSTAL ORIENTATION; ELECTRON BEAMS; ELECTRON DIFFRACTION; OXIDATION; STRAIN;

LARGE-ANGLE CONVERGENT BEAM ELECTRON DIFFRACTION (LACBED); LOCAL OXIDATION OF SILICON (LOCOS) STRUCTURES;

SEMICONDUCTING SILICON;

SILICON;

ANALYTIC METHOD; CHEMICAL MODIFICATION; ELECTRON DIFFRACTION; MATHEMATICAL ANALYSIS; OXIDATION; REVIEW; SIMULATION;

CANIS;

EID: 0032721256     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(99)00112-6     Document Type: Article

References (24)

1. J. Vanhellemont, Ph.D. Thesis, University of Antwerp, 1990.
2. De Wolf I., Vanhellemont J., Romano-Rodrìguez A., Norström H., Maes H.E. J. Appl. Phys. 71:1992;898.
3. Hu S.M. J. Appl. Phys. 70:1991;R53.
4. P. Smeys, P.B. Griffin, Z.U. Rek, I. De Wolf, K.C. Saraswat, Proceedings of IEDM 96, San Francisco, 1996, p. 709.
5. Jones P.M., Rackham G.M., Steeds J.W. Proc. Roy. Soc. London A. 354:1977;197.
6. Armigliato A., Balboni R., De Wolf I., Frabboni S., Janssens K.G.F., Vanhellemont J. Inst. Phys. Conf. Ser. 134:1993;229.
7. Armigliato A., Balboni R., Corticelli F., Frabboni S., Malvezzi F., Vanhellemont J. Mater. Sci. Technol. 11:1995;400.
8. Armigliato A., Balloni R., Benedetti A., Frabboni S., Tixier A., Vanhellemont J. J. Physique III. 7:1997;1.
9. Cherns D., Preston A.R. J. Electron Microsc. Tech. 13:1989;111.
10. F. Wu, A. Armigliato, R. Balboni, S. Frabboni, Micron (1999), in press.
11. K.G.F. Janssens, Ph.D. Thesis, University of Leuven, 1996.
12. Janssens K.G.F., Vanhellemont J., De Graef M., Van der Biest O. Ultramicroscopy. 45:1992;323.
13. P. Hirsch, A. Howie, R.B. Nicholson, D.W. Pashley, M.J. Whelan, Electron Microscopy of Thin Crystals, Robert E. Krieger, Huntington, New York, 1997, p. 291.
14. J.C.H. Spence, J.M. Zuo, Electron Microdiffraction, Plenum, New York, 1992, 35.
15. Duan X.F., Cherns D., Steeds J.W. Philos. Mag. A. 70:1994;1091-1105.
16. Howie A., Whelan M.J. Proc. Roy. Soc. (London) A. 263:1961;217.
17. Peng L.M., Whelan M.J. Proc. Roy. Soc. (London) A. 431:1990;111.
18. Wang S.Q., Peng L.-M., Duan X.F., Chu Y.M. Ultramicroscopy. 45:1992;405-409.
19. Rossouw C.J., Perovic D.D. Ultramicroscopy. 48:1993;49-61.
20. J.F. Chen, X.F. Duan, J. Zhu, J. Chinese Electron Microsc. Soc., in press.
21. Zou H., Liu J., Ding D., Wang R., Froyen L., Delaey L. Ultramicroscopy. 72:1998;1.
22. Garulli A., Armigliato A., Vanzi M. J. Microsc. Spectrosc. Electron. 10:1985;135.
23. A. Armigliato, R. Balboni, S. Balboni, S. Frabboni, A. Tixier, G.P. Carnevale, P. Colpani, G. Pavia, A. Marmiroli, Micron (1999), in press.
24. Vanhellemont J., Janssens K.G.F., Frabboni S., Smeys P., Balboni R., Armigliato A. Mat. Res. Soc. Symp. Proc. 405:1996;435.