Transmission electron diffraction techniques for NM scale strain measurement in semiconductors

Materials Research Society Symposium - Proceedings

Volumn 405, Issue , 1996, Pages 435-446

  Vanhellemont, J ^a   Janssens, K G F ^a   Frabboni, S ^a   Smeys, P ^a   Balboni, R ^a   Armigliato, A ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON DIFFRACTION; FINITE ELEMENT METHOD; IMAGING TECHNIQUES; SEMICONDUCTOR MATERIALS; STRAIN MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

CONVERGENT BEAM ELECTRON DIFFRACTION (CBED); ELECTRON DIFFRACTION CONTRAST IMAGING (EDCI);

NANOSTRUCTURED MATERIALS;

EID: 0029726504     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (37)