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Volumn 147, Issue 1-4, 1999, Pages 238-243

Xenon-ion-beam modifications of a-SiO2 and Ni/a-SiO2 layers

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; INTERFACES (MATERIALS); ION BOMBARDMENT; MORPHOLOGY; NICKEL; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SPUTTERING; SURFACE ROUGHNESS; XENON;

EID: 0032714985     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00536-9     Document Type: Article
Times cited : (6)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.