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Volumn 147, Issue 1-4, 1999, Pages 238-243
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Xenon-ion-beam modifications of a-SiO2 and Ni/a-SiO2 layers
a
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
ANNEALING;
INTERFACES (MATERIALS);
ION BOMBARDMENT;
MORPHOLOGY;
NICKEL;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SILICA;
SPUTTERING;
SURFACE ROUGHNESS;
XENON;
ION BEAM MIXING;
ION BEAM MODIFICATION;
SURFACE PROFILOMETRY;
SURFACE ROUGHENING;
ION IMPLANTATION;
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EID: 0032714985
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(98)00536-9 Document Type: Article |
Times cited : (6)
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References (22)
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